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Reliability Modeling and Mitigation for Embedded Memories

机译:嵌入式记忆的可靠性建模与缓解

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CMOS technology scaling has faced over the past recent decades significant variability and reliability challenges both from the manufacturing and operational point of view. It is well recognised that Bias Temperature Instability (BTI) is one of the most (if not the most) aging mechanisms for CMOS technology. The impact of such mechanism has been heavily studied for memory cell array of SRAMS, but not enough for peripheral circuit and its overall impact on the memory functionality. This paper quantifies the impact of BTI on the write path and read path of an SRAM while considering different supply voltages, temperatures, workloads and technology nodes. The results show that the BTI impact is marginal for the write circuitry, irrespective of the workload and technology. In contrast, the impact is much higher (~3× more) for the read path, where the sense amplifier (SA) is the most sensitive part. Therefore, a mitigation scheme for the SA is proposed and evaluated. The results show that the SA offset voltage specification can be reduced significantly (~3.5×),
机译:CMOS技术缩放面临近几十年来,从制造和运营的角度来看,近几十年来近几十年来的显着变化和可靠性挑战。众所周知,偏置温度不稳定性(BTI)是CMOS技术的最多(如果不是最多)老化机制之一。这种机制对SRAM的存储器单元阵列进行了大量研究,但对外围电路还没有足够的对存储器功能的影响。本文在考虑不同电源电压,温度,工作负载和技术节点的同时量化了BTI对SRAM写路径和读取路径的影响。结果表明,无论工作量和技术如何,BTI冲击都是用于写入电路的边缘。相比之下,读取路径的影响要高得多(〜3倍),其中读出放大器(SA)是最敏感的部分。因此,提出并评估了SA的缓解方案。结果表明,SA偏移电压规范可显着降低(〜3.5×),

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