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Reliability Modeling and Mitigation for Embedded Memories

机译:嵌入式内存的可靠性建模和缓解

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CMOS technology scaling has faced over the past recent decades significant variability and reliability challenges both from the manufacturing and operational point of view. It is well recognised that Bias Temperature Instability (BTI) is one of the most (if not the most) aging mechanisms for CMOS technology. The impact of such mechanism has been heavily studied for memory cell array of SRAMS, but not enough for peripheral circuit and its overall impact on the memory functionality. This paper quantifies the impact of BTI on the write path and read path of an SRAM while considering different supply voltages, temperatures, workloads and technology nodes. The results show that the BTI impact is marginal for the write circuitry, irrespective of the workload and technology. In contrast, the impact is much higher (~3× more) for the read path, where the sense amplifier (SA) is the most sensitive part. Therefore, a mitigation scheme for the SA is proposed and evaluated. The results show that the SA offset voltage specification can be reduced significantly (~3.5×),
机译:从制造和操作的角度来看,近几十年来,CMOS技术的扩展一直面临着巨大的可变性和可靠性挑战。众所周知,偏置温度不稳定性(BTI)是CMOS技术中最多(如果不是最多)老化机制之一。对于SRAMS的存储单元阵列,已经对这种机制的影响进行了深入研究,但对于外围电路及其对存储功能的总体影响还不够。本文在考虑不同的电源电压,温度,工作量和技术节点的同时,量化了BTI对SRAM的写入路​​径和读取路径的影响。结果表明,无论工作量和技术如何,BTI对写电路的影响都很小。相反,对于读路径,其影响要大得多(约3倍),其中读出放大器(SA)是最敏感的部分。因此,提出并评估了SA的缓解方案。结果表明,SA偏移电压规格可以大大降低(〜3.5倍),

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  • 来源
    《International Test Conference》|2019年|1-10|共10页
  • 会议地点 Washington(US)
  • 作者单位

    Delft University of Technology Faculty of Electrical Engineering Mathematics and Computer Science Mekelweg 4 Delft The Netherlands 2628 CD;

    Delft University of Technology Faculty of Electrical Engineering Mathematics and Computer Science Mekelweg 4 D;

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