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Sensitive Devices and Phase Noise Degradation Mechanisms on all-NMOSFET RF VCO Aging

机译:All-NMOSFET RF VCO老化的敏感装置和相位噪声劣化机制

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Device level reliability is introduced into simulations of an optimized all-NMOSFET, cross-coupled, radiofrequency Voltage Controlled Oscillator to trace the sensitive devices and parameters that reduce circuit performance over time. Parametric DC time dependent degradation is considered in all the devices of the circuit along with correlated flicker and thermal noise increase under hot carrier injection stress. Results show that, rather than the changes introduced by stress on DC parameters, the proposed topology is very sensitive to device level noise increase due to stress-induced traps, particularly at early stages of circuit life. This highlights the requirement of a unified simulation framework that takes into account not only DC/AC small signal degradation models but also device noise degradation in noise sensitive circuits.
机译:将设备电平可靠性引入到优化的全NMOSFET,交叉耦合的射频电压控制振荡器的模拟中,以跟踪敏感设备和降低电路性能随时间的参数。在电路的所有设备中考虑参数DC时间依赖性劣化以及在热载体注射应力下的相关闪烁和热噪声增加。结果表明,由于压力诱导的陷阱,所提出的拓扑结构对DC参数的压力引入的压力引入的变化,特别是在电路寿命的早期阶段的设备级噪声增加非常敏感。这突出了统一仿真框架的要求,该框架不仅考虑了DC / AC小信号劣化模型,还考虑了噪声敏感电路中的设备噪声劣化。

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