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Experimental investigations on cathode spots and dynamical vacuum arc structure in an axial magnetic field

机译:轴向磁场中阴极斑点的实验研究和动力学真空弧形结构

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In this paper the ampacity of cathode spots and structures of cathode spots on an AMF contact at short gap distance are investigated by observation of the arc behavior with a high-speed, high resolution CCD video camera. While the current carried by a single cathode spot is independent of the short circuit current, the number of the cathode spots and the voltage drop between the contacts increase linearly with the total current. Further the dynamical structure of the arc is studied and the variation of the density of the cathode spots over the current is measured. At the limit of the breaking capability of the contacts the maximum average current density is about 1.8kA/cm2 (RMS), which conforms well to the experience with commercial vacuum interrupters. Above this point the CuCr contact surface melts homogeneously over several square centimetres. Although the molten surface layer thickness is assumed to be a few tens to hundreds of microns only, millimetre-sized protrusions grow rapidly, providing a rough and quickly changing cathode surface. We discuss the growth and dynamics of these surface structures in terms of hydrodynamic instabilities and provide a model for the formation process.
机译:在本文中,通过观察具有高速高分辨率的CCD摄像机的电弧行为来研究阴极斑点和阴极斑点的阴极斑点的结构。虽然由单个阴极点携带的电流无关,但是阴极斑点的数量和触点之间的电压降随着总电流的线性而增加。此外,研究了电弧的动态结构,并测量了电流上的阴极斑的密度的变化。在接触的断裂能力的极限下,最大平均电流密度为约1.8kA / cm 2 (rms),其符合商业真空中断器的经验。在此之上,CUCR接触表面在几平方厘米上均匀地熔化。尽管假设熔融的表面层厚度仅为几十至数百微米,但毫米尺寸的突起迅速生长,提供粗糙且快速地改变的阴极表面。我们在流体动力学稳定性方面讨论了这些表面结构的生长和动态,并为地层过程提供了模型。

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