Model of an optical system's influence on sensitivity of microbolometric focal plane array

摘要

Thermal imagers and used therein infrared array sensors are subject to calibration procedure and evaluation of their voltage sensitivity on incident radiation during manufacturing process. The calibration procedure is especially important in so-called radiometric cameras, where accurate radiometric quantities, given in physical units, are of concern. Even though non-radiometric cameras are not expected to stand up to such elevated standards, it is still important, that the image faithfully represents temperature variations across the scene. The detectors used in thermal camera are illuminated by infrared radiation transmitted through a specialized optical system. Each optical system used influences irradiation distribution across an sensor array. In the article a model describing irradiation distribution across an array sensor working with an optical system used in the calibration set-up has been proposed. In the said method optical and geometrical considerations of the array set-up have been taken into account. By means of Monte-Carlo simulation, large number of rays has been traced to the sensor plane, what allowed to determine the irradiation distribution across the image plane for different aperture limiting configurations. Simulated results have been confronted with proposed analytical expression. Presented radiometric model allows fast and accurate non-uniformity correction to be carried out.