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Design of a Low Power 11T-1MTJ Non-Volatile SRAM Cell with Half-Select Free Operation

机译:低功耗11T-1MTJ非易失性SRAM单元,具有半选择自由操作

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Over the past few decades, CMOS scaling has been a key driving factor to achieve faster, cheaper and denser digital systems. However, as the technology scales down, there is an exponential increase in leakage current which poses serious design challenges for low power system. SRAM being the biggest on-chip component, suffers from large static power dissipation which in turn significantly affects the overall performance of the system. In addition to large power consumption, SRAM cell also suffers from half-select disturbance issue which severely degrades the reliability of system. So, to address the aforementioned challenges, we review and compare the various existing SRAM cells in order to select the best SRAM cell design (TFC-9T) which offers advantages of low power and half-select disturbance free operation. To further reduce the static power consumption, we propose to modify the selected TFC-9T SRAM cell using emerging non-volatile magnetic tunnel junction (MTJ).
机译:在过去的几十年里,CMOS缩放一直是实现更快,更便宜和更密集的数字系统的关键驱动因素。然而,随着技术缩小的,漏电流的指数增加,对低功率系统构成了严重的设计挑战。 SRAM是最大的片上组件,遭受大量静态功耗,这反过来又会显着影响系统的整体性能。除了大功耗外,SRAM单元还遭受了半选择的干扰问题,严重降低了系统的可靠性。因此,要解决上述挑战,我们审查并比较各种现有的SRAM单元,以便选择最佳SRAM单元设计(TFC-9T),该设计提供低功耗和半选择无干扰的优点。为了进一步降低静态功耗,我们建议使用新出现的非易失性磁隧道结(MTJ)来修改所选择的TFC-9T SRAM单元。

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