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Ultrafast ablation with high-pulse-rate Nd:YAG lasers: II. Experiments on deposition of diamondlike carbon films

机译:高脉冲率ND:YAG激光器的超快消融:II。金刚石碳膜沉积的实验

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The novel technique of ultrafast pulsed laser deposition has been experimentally demonstrated by depositing high quality diamond-like carbon films using high repetition rate Nd:YAG lasers. A very effective evaporation regime was achieved by keeping the laser intensity on the target surface close to the optimum values determined in Part 1 of this paper. Evaporation of the target by low energy laser pulses at an intensity of 10$+9$/ W/cm$+2$/ allows the elimination of particles from the vapor and results in films with very high surface quality, while the very high repetition rate increases the overall deposition rate. Results are presented on the evaporation of carbon using either a 10 kHz, 120 ns Q-switched Nd:YAG laser, or a 76 MHz 60 ps mode-locked Nd:YAG laser. The number of particles visible in optical microscope on the DLC film deposited using the mode-locked laser was less than one particle per mm$+2$/. SEM images demonstrated that the deposited film had a very fine surface texture of with nanoscale irregularities on the surface. AFM surface microroughness measurements revealed a saturation-like behavior of the RMS roughness at the level 12 nm over the whole deposited surface area for 10 kHz Q-switched laser evaporation and almost an atomic level (less than 1 nm) roughness for the 76 MHz mode-locked laser evaporation. Raman spectroscopy of the deposited films indicated that they were a mixture of sp$+3$/ and sp$+2$/ bonded amorphous carbon. The thickness of the diamond-like carbon film deposited simultaneously on two 4 inch silicon wafers varied by only plus or minus 5% over an area of approximately 250 cm$+2$/ and the deposition rate was approximately 2 $MIN 6 angstrom/s at a distance of approximately 150 mm from the target.
机译:的超快脉冲激光沉积该新颖技术已通过沉积已经实验证实高质量金刚石状使用高重复率的Nd碳膜:YAG激光器。一个非常有效的蒸发政权被保持激光强度在目标表面靠近在本文的第1部分中确定的最佳值达到。以10 $ + 9 $的强度由低能量激光脉冲的靶的蒸发/ W /厘米$ + 2 $ /允许在薄膜从蒸气颗粒和结果的消除具有非常高的表面质量,而非常高的重复率增加了总的沉积速率。结果表示在碳上的使用一个10千赫的蒸发,120纳秒Q开关Nd:YAG激光器,或一个76兆赫60个PS锁模的Nd:YAG激光。沉积在使用上的DLC膜光学显微镜可见颗粒的数量的锁模激光是每毫米$ + 2 $ /小于一个颗粒。 SEM图像显示,所沉积的膜具有与所述表面上的纳米级的凹凸非常精细的表面纹理。 AFM表面微粗糙度测量显示为76 MHz模式的饱和状在在整个沉积表面面积的水平为12nm为10千赫的RMS粗糙度的行为Q开关激光蒸发和几乎原子水平(小于1nm)的粗糙度-locked激光蒸发。沉积膜的拉曼光谱表示它们的SP $ + 3 $ /和SP $ + 2 $ /键合非晶碳的混合物。同时沉积在两个4英寸的硅晶片上的类金刚石碳薄膜的通过仅加上或减去5%以上的约250厘米面积而变化的厚度$ + 2 $ /和沉积速率为大约2 $ MIN 6埃/秒在从目标大约150毫米的距离。

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