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Ultrafast ablation with high-pulse-repetition-rate lasers: I. Theoretical considerations

机译:超快消融高脉冲重复速率激光器:I。理论考虑

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The novel technique for deposition of a high quality thin films of different materials by the use of picosecond laser pulses delivered on a target with the repetition rate of several tens of megahertz is proposed. The differences of the proposed method from the conventional pulse laser deposition is due to shorter laser pulses (picosecond instead of nanosecond) and higher repetition rate which is tens of megahertz (MHz) instead of tens of hertz (Hz). The method allow us to significantly improve the quality of a film due to a decrease by nine orders of magnitude in a number of particles evaporating during a single laser pulse in comparison to that produced by nanosecond, 30 Hz lasers, thus removing a major disadvantage of laser deposition method which is the formation of particulates on the film. The use of a very high repetition rate laser also leads to a qualitatively new mode of vapor-substrate interaction. Due to the short time (10$+$MIN@7$/ - 10$+$MIN@8$/ sec) between the laser pulses a quasi-continuous laser plume is formed. The particles evaporated by the previous laser pulse and just deposited on the substrate do not cool down significantly by the time when the particles from the following laser pulse arrive, and therefore their chemical bonds are still reactive. As a result, the high repetition rate regime of evaporation allows for formation of structures on the substrate such as, for example, carbon nanotubes, polymer chains, etc. Another advantage is the opportunity of scanning the laser focal spot over different targets of different materials which allows for a deposition of multilayered films containing mono-atomic layers of different atoms. The results on ultrafast laser ablation and deposition are presented in two joint papers. In this paper (Part I) we present the theoretical justification of the ultrafast laser deposition method, calculating the vapor characteristics, evaporation and deposition rates for the optimal evaporation regime for different modes of laser- target interaction. In the second paper (Part II) the experimental results on evaporation of a graphite target, deposition of high quality diamond-like (DLC) films and the comparison of the laser plume characteristics to theory are presented.
机译:提出了一种用于不同材料的通过使用具有几十兆赫兹的重复率上的目标输送皮秒激光脉冲的高质量薄膜的沉积该新颖技术。所提出的方法从常规脉冲激光沉积的差异是由于较短的激光脉冲(皮秒代替纳秒)和较高的重复速率是几十兆赫兹(MHz),而不是几十赫兹(Hz)的。该方法允许我们的膜的质量显著改善因在许多单个激光脉冲期间蒸发颗粒在相比于通过纳秒,30个赫兹激光器产生的减少数量级的九级,从而消除的主要缺点激光沉积方法,其是在膜的微粒的形成。使用非常高的重复率激光还导致蒸汽 - 底物相互作用的新的质量模式。由于短的时间 - 激光器之间(10 $ + $ MIN @ 7 $ / 10 $ + $ MIN @ $ 8 /秒)脉冲形成准连续激光羽。所述颗粒中蒸发由先前激光脉冲和刚刚沉积在衬底上不通过时间显著冷却时,从下面的激光脉冲的颗粒到达,并且因此它们的化学键仍然反应性的。其结果是,蒸发的高重复率制度允许在衬底上形成结构,如,例如,碳纳米管,聚合物链等的另一个优点是在不同材料的不同的目标扫描激光焦斑的机会这允许包含不同原子的单原子层的多层膜的沉积。超快激光烧蚀和沉积的结果在两个联合文件呈现。在本文中(第I部分),我们目前的超快激光沉积法的理论依据,计算用于为激光靶相互作用的不同模式的最佳蒸发制度的蒸气的特性,蒸发和沉积速率。在第二纸张(第二部分)上的石墨靶的蒸发的实验结果,高质量的类金刚石(DLC)膜的沉积和激光羽流特性,以理论的比较被呈现。

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