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A Novel Bit Alterable 3D NAND Flash Using Junction-free P-channel Device with Band-to-Band Tunneling Induced Hot-Electron Programming

机译:一种新型位可改变的3D NAND闪光,使用带有带对带隧道诱导的热电子编程的连接P沟道装置

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We demonstrate a novel p-channel 3D stackable NAND Flash that uses completely new programming and erasing methods. The p-channel 3D NAND avoids the disadvantage of GIDL induced hole erase of floating body n-channel NAND, giving a highly efficient -FN hole erasing and negligible disturb on the SSL and GSL devices. The p-channel NAND structure enables a novel -FN erase selection method, providing a unique feature of bit alterable erase that facilitates small-unit random code overwrite without block erase. Furthermore, the band-to-band tunneling induced hot-electron programming method provides lower operation voltage and is good for peripheral CMOS scaling. The device concept is demonstrated on a 37.5nm half-pitch 3D vertical gate (VG) junction-free NAND architecture.
机译:我们展示了一种新颖的P沟道3D可堆叠NAND闪光,其使用全新的编程和擦除方法。 P沟道3D NAND避免了GIDL诱导孔擦除浮体N沟道Nand的缺点,在SSL和GSL器件上提供高效-FN孔擦除和可忽略不计的干扰。 P频道NAND结构使新颖的-FN擦除选择方法能够提供一定的可改变擦除特征,便于小单位随机码覆盖而没有块擦除。此外,带对频隧道沟沟沟沟沟沟沟沟沟沟沟沟沟沟沟沟沟沟沟沟沟沟型较低的运行电压,并且适用于外围CMOS缩放。设备概念在37.5nm半间距3D垂直门(VG)结NAND NAND架构上进行了演示。

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