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Very High κ and High Density TiTaO MIM Capacitors for Analog and RF applications

机译:用于模拟和RF应用的非常高κ和高密度TITAO MIM电容器

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摘要

For the first time, high density (10.3 fF/μm{sup}2), low voltage linearity (α=89 ppm/V{sup}2) and small leakage current (1.2×10{sup}(-8) A/cm{sup}2) or 5.8 fA/[pF·V] at 2V) meet all the ITRS requirements of analog capacitor at year 2018. These are achieved by novel high-K TiTaO (k=45) and high work-function Ir capacitor, which further improve to very high 23 fF/μm{sup}2) density and low 81 ppm/V{sup}2) linearity for higher speed analog/RF ICs at 1GHz, using the fast a decay mechanism with increasing frequency.
机译:首次,高密度(10.3ff /μm{sup} 2),低电压线性度(α= 89ppm / v {sup} 2)和小的漏电流(1.2×10 {sup}( - 8)a / 2V的CM {SUP} 2)或5.8 FA / [PF·V]符合2018年模拟电容的所有ITRS要求。这些是通过新型高k钛(K = 45)和高功函数IR实现的电容器,进一步改进于非常高的23FF /μm{sup} 2)密度和低81ppm / v {sup} 2)线性,在1GHz时使用快速衰减机制在1GHz时为更高速度的模拟/射频ICS线性度。

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