SELECTIVE NUCLEATION AND AREA SELECTIVE OMCVD OF GOLD ON PATTERNED SELF-ASSEMBLED ORGANIC MONOLAYERS: A COMPARISON OF OMCVD AND PVD

摘要

We demonstrate the area selective organometallic chemical vapor deposition (OMCVD) of gold clusters and layers using trimethylphospine-methylgold (CH_3)_3PAuCH_3 as gold source onto self-assembled monolayers (SAMs) of ω-functionalized long chain alkanethiols on gold and silver coated silicon and mica samples. The dependence of surface coverage with gold nano-clusters on the reaction time is analyzed by atomic force microscopy (AFM). X-ray photoelectron spectroscopy (XPS) shows that nucleation and growth only occurs on thiol functionalized surfaces and not on methyl or hydroxyl functionalized SAMs. The selectivity of the growth is completely lost if gold is deposited by thermal evaporation of the pure metal as shown in direct comparison with the OMCVD method employing mixed SAMs of different surface reactivity (-SH vs. -CH3) that were patterned by microcontact printing.