Modification of Silicon Surface by Direct Laser Interference

摘要

Periodic and quasi-periodic structures on silicon surface have numerous significant applications in photoelectronics and surface engineering. A number of technologies have been developed to fabricate these structures in various research areas. In this work, we take the strategy of direct nanosecond laser interference patterning technology. Well-defined grating and dot structures have been achieved and interactive thermal effect was observed obviously. Additionally, the height and width of different structures were analyzed by. AFM. It can be demonstrated that direct laser interference lithography is a promising technology which has the capability for the manufacturing of micro and nano structures.