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Investigation on Phase-Induced Surface Energy Change of HfO_2 Thin Films Prepared By Plasma Enhanced Atomic Layer Deposition

机译:等离子体增强原子层沉积制备的HFO_2薄膜相诱导表面能变化的研究

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Wettability of nanomaterials has been researched for the scientific physics based on solid/liquid interfaces. In particular, wettability of ceramic materials which is directly relevant to the surface free energy has been researched for its nature continuously in terms of thin film coatings. The development of such materials with finely tunable surface free energy and adequate stability under harsh conditions has been attracted enormous interests involving various applications. Among them, Hafnium oxide (HfO_2), one of the representative transition metal oxides, has been recently studied for robust coating materials with investigation of its surface free energy. However, due to the complexity derived from environmental factors in a stack and differences between variety of deposition parameters, the surface free energy of HfO_2 films has not been fully understood. Apart from the fact that the previously reported water contact angle (WCA) of HfO_2 thin or bulk films highly vary between literatures, the interpretation of surface free energy of HfO_2 and its intrinsic wettability still lacks of systematic approaches. In this study, we comprehensively investigated the surface free energy variation in HfO_2 films prepared by plasma enhanced atomic layer deposition (PE-ALD). Upon precise control of film thickness with the aid of PE-ALD technique, we analyzed the surface free energy changes depending on the various properties of HfO_2 films including film thickness, chemical composition, surface roughness, film crystallinity. We focused on a dependency of surface free energy of HfO_2 films on film crystallinity as a determining factor for wettability changes. For in-depth studies, we performed thermal annealing treatment on PE-ALD HfO_2 films and observed apparent correlation between wettability and film crystallinity. Based on the control of film crystallinity, PE-ALD HfO_2 thin films show versatile wetting behaviors as to exposure of liquids with different surface energies. The experimental results from our work will contribute to the fundamental understanding of surface free energy of thin film HfO_2 and its scientific backgrounds, and can also lead to feasible applications including liquid separation and purifications using HfO_2 as robust coating film.
机译:基于固体/液体界面的科学物理研究了纳米材料的润湿性。特别地,在薄膜涂层方面,已经研究了与表面自由能直接相关的陶瓷材料的润湿性。这种材料的开发具有细化的表面自由能和在恶劣条件下的充分稳定性被吸引着涉及各种应用的巨大兴趣。其中,最近已经研究了具有其表面自由能的鲁棒涂料的氧化铪(HFO_2)。然而,由于堆叠中的环境因子的复杂性和各种沉积参数之间的差异,HFO_2膜的表面自由能尚未得到完全理解。除了先前报道的HFO_2薄或散装薄膜的水接触角(WCA)之间的作品之间的高度不同,对HFO_2的表面自由能的解释及其内在润湿性仍然缺乏系统的方法。在这项研究中,我们全面研究了等离子体增强原子层沉积(PE-ALD)制备的HFO_2膜的表面自由能变化。借助于PE-ALD技术精确控制膜厚度,我们根据包括膜厚度,化学成分,表面粗糙度,薄膜结晶度的HFO_2薄膜的各种性能分析表面自由能变化。我们专注于HFO_2薄膜在薄膜结晶上的表面自由能的依赖性,作为润湿性变化的确定因素。对于深入研究,我们对PE-ALD HFO_2薄膜进行热退火处理,并观察到润湿性和薄膜结晶度之间的表观相关性。基于薄膜结晶度的控制,PE-ALD HFO_2薄膜显示多功能的润湿行为,以及暴露于不同表面能的液体。我们工作的实验结果将有助于对薄膜HFO_2的表面自由能的基本理解及其科学背景,并且还可以导致可行的应用,包括使用HFO_2作为鲁棒涂膜的液体分离和纯化。

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