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(Invited) Atomistic Understanding on the Surface of GaAs By Ab Initio Thermodynamics; From Equilibrium Shape to Growth Shape

机译:(邀请)AB Initio热力学对GaAs表面的原子理解; 从均衡形状到生长形状

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The III-V semiconductor nanowires (NWs) have attracted substantial attention as an ideal system for the study on the growth mechanism and electronic device applications. For the precise manipulation of the nanowire growth, understanding on the temperature-pressure (T-P) dependent variation in surface energy and reconstruction which governs the anisotropic interaction between vapor sources and crystal solids is crucial. Unfortunately, the quantitative values of the variation in surface energy cannot be obtained only using the conventional electronic structure calculation. To overcome this difficulty, we have developed a reliable ab initio thermodynamic method by which the T-P dependent surface energy is predicted from the atomic-scale calculations on: surface reconstructions of InAs; equilibrium crystal shapes of GaAs and InAs; and anisotropic adsorption and growth conditions of GaAs NW.
机译:III-V半导体纳米线(NWS)吸引了大量关注作为对生长机制和电子设备应用研究的理想系统。 为了精确地操纵纳米线生长,了解对表面能量和重建的温度压力(T-P)依赖性变化,其治理蒸气源和晶体固体之间的各向异性相互作用是至关重要的。 遗憾的是,通过传统的电子结构计算,不能仅获得表面能的变化的定量值。 为了克服这种困难,我们开发了一种可靠的AB Initio热力学方法,通过该方法可以从原子级计算中预测T-P依赖性表面能:INA的表面重建; GaAs和InAs平衡晶体形状; 和GaAs NW的各向异性吸附和生长条件。

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