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Substrate bias effects on noise and minority carrier lifetime in SOI MOSFET single-photon detector

机译:SOI MOSFET单光子检测器中的噪声和少数群体寿命的基板偏差

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Operation speed of the single-photon detector based on the silicon-on-insulator (SOI) metal-oxide-semiconductor field-effect transistor (MOSFET) is affected by the noise and minority carrier lifetime, both of which are found to be dependent on the substrate bias. The noise spectrum are obtained at various substrate voltages in dark condition while keeping the average drain current constant. The noise becomes minimum at around the transition point between front- and back-channel operations, and in the back-channel region near the transition point. On both negative and positive sides of the substrate voltage, the noise shows peculiar Lorentzian spectra. Minority carrier lifetime is evaluated by the analysis of drain current histogram at different substrate voltages. It is found that the peaks in the histogram corresponding to the larger number of stored holes become higher as the substrate bias becomes more positive. This can be attributed to the prolonged lifetime presumably caused by the higher electric field inside the body of SOI MOSFET. It can be concluded that, once the inversion channel is induced for detection of the photo-generated minority carriers, the small absolute substrate bias is favorable for short lifetime and low noise, leading to high-speed operation.
机译:基于绝缘体(SOI)金属氧化物 - 半导体场效应晶体管(MOSFET)的单光子检测器的操作速度受到噪声和少数载体寿命的影响,这两者都被发现取决于衬底偏置。在暗状态下在各种基板电压下获得噪声频谱,同时保持平均漏极电流常数。噪声围绕前沿和后声道操作之间的过渡点围绕过渡点,以及在转换点附近的后沟道区域之间变为最小。在基板电压的两个负极和正边上,该噪声显示了特殊的Lorentzian光谱。通过在不同基板电压下的漏极电流直方图的分析来评估少数竞赛终潮。结果发现,随着衬底偏置变为更正常的,对应于较大数量的储存孔的直方图中的峰值变得更高。这可以归因于由SOI MOSFET主体内的较高电场引起的延长寿命。可以得出结论,一旦诱导了反演信道以检测照片产生的少数载波,小绝对衬底偏置对于短寿命和低噪声是有利的,导致高速操作。

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