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Effect of Gauss doping profile on electric potential of p-n diode

机译:高斯掺杂轮廓对P-N二极管电位的影响

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This study aimed to determine the effects of Gauss doping profile on electric potential of p-n diode. This effect is studied by simulating PN diodes at equilibrium condition with differences in doping fall-off constant (dfc) using MATLAB and COMSOL software. According to the simulation results, it concluded that p-n diode with different Gaussian doping profile, will produce similar built-in voltage (VGbi). But, each p-n diode with different Gaussian doping profile, has different maximum junction voltage (Vjmax) and minimum junction voltage (Vjmin). These junction voltages have strong correlation with dfc. We propose an equation of built-in voltage for Gauss Doping Profile, and also equations of Vjmax and Vjmin
机译:该研究旨在确定高斯掺杂谱对P-N二极管电势的影响。 通过使用MATLAB和COMSOL软件模拟诸如掺杂脱落常数(DFC)的差异的PN二极管来研究这种效果。 根据仿真结果,它得出结论,具有不同高斯掺杂型材的P-N二极管,将产生类似的内置电压(V GBI )。 但是,具有不同高斯掺杂型材的每个P-N二极管,具有不同的最大结电压(V JMAX )和最小结电压(V JMIN )。 这些连接电压与DFC具有很强的相关性。 我们提出了高斯掺杂型材的内置电压的等式,以及V JMAX 和V JMIN &#x2022的方程式。

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