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Fabrication process for a novel high speed coplanar-to-coaxial off-chip interconnect

机译:一种新型高速共面对同轴切片互连的制造工艺

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In this paper, we present the design and fabrication of a novel chip-to-chip interconnect scheme for use in System-in-Package applications. The interconnect system uses an etched trench at the edge of a standard Silicon substrate to interface a miniature coaxial cable to the on-chip surface metal layers. This system delivers a shielded, matched impedance transmission path by using a coplanar structure on-chip and a coaxial structure between chips. This system is designed to be compatible with typical perimeter bonded pad sizing and spacing such that the coplanar-to-coaxial transition can be selectively added to a standard wire bond process on high-speed nets.
机译:在本文中,我们介绍了一种用于系统内应用程序的新型芯片到芯片互连方案的设计和制造。 互连系统在标准硅衬底的边缘处使用蚀刻沟槽,以将微型同轴电缆连接到片上表面金属层。 该系统通过在片上使用共面结构和芯片之间的同轴结构,提供屏蔽匹配的阻抗传输路径。 该系统设计成与典型的周边键合焊盘施胶和间隔兼容,使得可以选择性地将共面对同轴的转变选择性地添加到高速网络上的标准线键合工艺中。

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