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Synthesis of diamond on WC-Co substrates using a KrF excimer laser in combination with a combustion flame

机译:使用KRF准分子激光器与燃烧火焰组合使用KRF准分子激光器在WC-Co底板上的合成

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A KrF excimer laser was used in combination with a combustion flame to deposit diamond films on cemented tungsten carbide (WC-Co) substrates. The laser has a wavelength of 248 nm, a pulse width of 23 ns, a pulse energy range of 84~450 mJ, and a repetition rate up to 50 Hz. Using the combustion flame method, diamond films were deposited on the laser-processed WC-Co substrates for 10 min. The morphologies of the deposited diamond films were examined using a scanning electron microscopy (SEM). The composition and bonding structures in the deposited films were studied by energy dispersive X-ray analysis (EDX) and Raman spectroscopy, respectively. The film adhesion was characterized by scratching a razor across the films. It was found that C composition on WC-Co substrate surfaces was eliminated by the laser irradiation. As a consequence, diamond nucleation density decreased and diamond grains grew larger in the laser-processed areas. Based on the experimental results, a film growth mechanism at different deposition temperature ranges corresponding to pre-deposition laser-surface-treatment effects was proposed.
机译:KRF准分子激光器与燃烧火焰组合使用,以沉积在粘液碳化钨(WC-CO)基材上的金刚石膜。激光的波长为248nm,脉冲宽度为23ns,脉冲能量范围为84〜450 mj,重复率高达50 hz。使用燃烧火焰方法,将金刚石薄膜沉积在激光加工的WC-Co底物上10分钟。使用扫描电子显微镜(SEM)检查沉积的金刚石膜的形态。通过能量分散X射线分析(EDX)和拉曼光谱法研究了沉积膜中的组成和粘合结构。通过在整个薄膜上刮擦剃刀,表征膜粘附。发现通过激光照射消除了WC-Co衬底表面上的C组合物。因此,钻石成核密度下降,激光加工区域中的钻石粒度更大。基于实验结果,提出了一种对应于预沉积激光表面处理效果的不同沉积温度范围的薄膜生长机制。

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