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Electrochemical pitting and pepassivation on icosahedral Al-Cu-Fe,and a comparison with crystalline phases

机译:IcosaheDral al-Cu-Fe上的电化学蚀与薄膜,以及与结晶相的比较

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We report the electrochemical potentials at which localized pitting and repassivation occur on icosahedral Al-Cu-Fe,and on a series of related alloys and elemental metals.The electrochemcistry occurs in a buffered NaCl solution,pH 8.4. Under these conditiosns,pitting and repassivation appear to be controlled mainly be the chaemical composition of the alloy,although the quasicrystalline phase displays an anomalous resistance to repassivation.Corrosion of this phase proceeds by dissolution of Al and Fe,leaving behind pits which are Cu-enriched.
机译:我们报告了ICosaheDral Al-Cu-Fe上局部点蚀和回归的电化学电位,以及一系列相关合金和元素金属。电化学发生在缓冲的NaCl溶液中,pH8.4。 在这些条件下,斑点和回复似乎是由合金的混乱组成的控制,尽管拟晶相显示出对重构的异常抗性。这种相位通过Al和Fe的溶解进行该相的腐蚀,留下凹陷 丰富。

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