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Micro-Texture and Physical Properties of the Cold-sprayed Copper Deposit

机译:冷喷涂铜矿的微观纹理和物理性质

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The cold spray (CS) method is a new deposition technique. In this technique, small solid particles impact and deposit on a substrate without melting. The deposition rate of the CS method is much higher than that of the other deposition processes. Expected applications of this technology are not only coating film production but also direct copper wiring technique for electronic products. This method also can be applied to patterning of thin films without photomasks. For example, an arbitrary geometry thin-film pattern can be formed on a substrate by scanning a spray nozzle. However, mechanical properties of the CS deposit and its micro-texture are found to be quite different from those of bulk copper. The previous researches showed that the CS deposit has high strength and indicates brittle-like fracture. The cold-sprayed copper deposit has a micro-texture which is stacked heavily deformed particles. The difference of the micro-texture between the cold-sprayed copper deposit and bulk copper is the main reason of the different mechanical properties. Thus, there is a possibility that the electrical properties of the cold-sprayed copper deposit are also different from bulk copper. In this study, both micro-texture and the electrical properties of the cold-sprayed copper deposit were measured by using SEM and EBSD technique and a four-point probe method. From the EBSD evaluation results, it was found that the average grain size in the deposited particles was much smaller than that of feed stock powder and bulk copper. The electrical resistivity of cold-sprayed copper deposit was much higher than that of bulk copper. The fine grain texture of the cold-sprayed copper deposit is one of the reasons for this high electrical resistivity.
机译:冷喷雾(CS)方法是一种新的沉积技术。在该技术中,小固体颗粒的冲击并沉积在基板上而不熔化。 CS方法的沉积速率远高于其他沉积过程的沉积速率。该技术的预期应用不仅是涂层薄膜生产,而且是电子产品的直接铜线技术。该方法还可以应用于没有光掩模的薄膜图案化。例如,可以通过扫描喷嘴在基板上形成任意几何薄膜图案。然而,发现CS沉积物及其微观纹理的机械性能与散装铜的机械性能完全不同。以前的研究表明,CS沉积物具有高强度,表明脆性骨折。冷喷涂的铜沉淀物具有微观纹理,该微观纹理堆叠了严重变形的颗粒。冷喷涂铜沉积物和散装铜之间的微观纹理的差异是不同机械性能的主要原因。因此,冷喷涂铜沉积物的电性能也与散装铜的电性能不同。在该研究中,通过使用SEM和EBSD技术和四点探针方法测量微观纹理和冷喷涂铜沉积的电性能。从EBSD评估结果中发现,沉积颗粒中的平均晶粒尺寸远小于饲料股粉和散装铜的粒度。冷喷涂铜矿的电阻率远高于散装铜的电阻率。冷喷涂铜沉积物的细粒质地是这种高电阻率的原因之一。

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