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A new device for highly accurate gas flow control with extremely fast response times

机译:具有极快速响应时间的高精度气体流量的新装置

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This paper presents a new type of control scheme and device for controlling gas flow into semiconductor process chambers. The key component of the Gas Flow Controller (GFC) is a high-precision valve with an integrated position sensor, which is used to maintain a constant flow rate. A map lookup scheme is employed to adjust the valve position to accommodate the upstream pressure, including any changes or disturbances. The layout of the flow controller also allows for the incorporation of a pressure-volume-time-temperature-based flow measurement, which is a primary standard flow measurement, to confirm and maintain flow accuracy throughout the device's lifetime. The fast response time of the sensors and the high sampling rate in the control loop enables the control of the gas flow within the order of tens of milliseconds.
机译:本文介绍了一种新型的控制方案和用于控制气流进入半导体过程室的装置。 气体流量控制器(GFC)的关键部件是具有集成位置传感器的高精度阀,其用于保持恒定的流速。 采用地图查找方案来调节阀门位置以适应上游压力,包括任何变化或干扰。 流量控制器的布局还允许掺入压力 - 体积时温度的流量测量,这是主要标准流量测量,以确认和维持整个设备的寿命的流动精度。 传感器的快速响应时间和控制回路中的高采样速率使得能够控制在数十毫秒的数量内的气流。

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