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Study of the Growth Mechanisms and Properties of (Cr,O,N) Films Deposited by Vacuum Arc Evaporation

机译:真空弧蒸发(Cr,O,N)薄膜的生长机制和性质研究

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Ternary chromium based films (Cr, O, N) have been deposited using the vacuum arc evaporation technique in a reactive (O_2 + N_2) atmosphere. The influence of the oxygen flow rate (Q_(O2)) on the structural and mechanical properties of the coatings, has been investigated when the nitrogen flow rate is held constant. It has been found that compounds composed on chromium, oxygen and nitrogen with a high hardness, can be deposited in a narrow range of Q_(O2).
机译:使用反应性(O_2 + N_2)气氛中的真空电弧蒸发技术沉积三元铬基薄膜(Cr,O,N)。 当氮流速保持恒定时,已经研究了对涂层结构和机械性能的氧流速(Q_(O2))的影响。 已经发现,可以在窄范围的Q_(O2)中沉积在铬,氧和氮上组成的化合物。

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