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Fabrication of Nanostructured Al-doped ZnO Thin Film for Methane Sensing Applications

机译:用于甲烷传感应用的纳米结构Al掺杂ZnO薄膜的制备

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CH_4 gas sensor was fabricated using spin-coating method of the nanostructured ZnO thin film. Effect of annealing temperature on the electrical and structural properties of the film was investigated. Dense nanostructured ZnO film are obtained at higher annealing temperature. The optimal condition of annealing temperature is 500°C which has conductivity and sensitivity value of 3.3 × 10~(-3) S/cm and 11.5%, respectively.
机译:使用纳米结构ZnO薄膜的旋涂方法制造CH_4气体传感器。研究了退火温度对薄膜电和结构性能的影响。在更高的退火温度下获得致密的纳米结构ZnO膜。退火温度的最佳条件为500℃,其具有3.3×10〜(-3)S / cm和11.5%的电导率和灵敏度值。

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