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Generation of Electron Beam with Millisecond Pulse Duration by Plasma-Cathode Source Based on the Arc Discharge in the Fore-vacuum Pressure Range

机译:基于前置压力范围内的电弧放电,通过等离子体阴极源具有毫秒脉冲持续时间的电子束

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The paper describes investigation of the possibility of generation of relatively high current (up to 25 A) largeradius electron beam with pulse duration of 4.2 ms by plasma-cathode source based on an arc discharge in the forevacuum pressure range. We research arc discharge features, electron emission from the discharge plasma, the threshold parameters (maximal working gas pressure and maximal emission current) of plasma-cathode source and propagation of electron beam with millisecond pulse duration in the fore-vacuum pressure range 3-28 Pa. It is shown, that for the arc with 4.2 ms pulse duration operating in the fore-vacuum plasma source a decrease of the arc current leads to an increase of discharge voltage, and the arc threshold (minimal) current is about 6-7 A. The sort of working gas and its pressure influence on the electron emission and the threshold parameters of plasma-cathode electron source. We obtained the electron beam generated in the pressure range 3-28 Pa with a pulse duration of 4.2 ms and an emission current of up to 25 A. The features of propagation of a millisecond electron beam are studied. Cross-sectional energy density distribution of electron beam for different distances and emission currents are presented. The obtained beam parameters provide to use 4.2 ms electron beam for the surface treatment of various materials by few (1-10) beam pulses.
机译:本文介绍了基于前弧压力范围内的电弧放电的等离子体阴极源产生相对高电流(最多25A)大型电流(最多25A)大型电流(最多25A)大型电束的可能性。我们研究了电弧放电功能,来自放电等离子体的电子发射,等离子体阴极源的阈值参数(最大工作气体压力和最大排放电流)和电子束的传播,在前真空压力范围内具有毫秒脉冲持续时间3-28 PA。显示,对于具有4.2ms脉冲持续时间的电弧,在前真空等离子体源中操作电弧电流的降低导致放电电压的增加,并且电弧阈值(最小)电流约为6-7 A.对电子发射的一种工作气体及其压力影响等离子体阴极电子源的阈值参数。我们获得了在压力范围3-28Pa中产生的电子束,脉冲持续时间为4.2ms,发射电流高达25 A.研究了毫秒电子束的传播特征。提出了不同距离和发射电流的电子束的横截面能量密度分布。所获得的光束参数提供了使用4.2 MS电子束,用于少量(1-10)束脉冲的各种材料的表面处理。

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