Power Pattern Sensitivity Analysis of Reflectarray Antennas to Substrate Uncertainties through the Minkowski Interval Analysis

摘要

In this work, the effect of the fabrication uncertainties on the substrate thickness on the radiation performance of the reflectarray antenna is addressed. An interval analysis (IA)-based method is used to compute the upper and lower bounds of the power pattern as a function of the deviations in the substrate thickness. The Minkowski Sum (MS) is exploited to combine interval phasors in order to mitigate the over-estimation of the power pattern bounds affecting standard Cartesian IA (IA-CS) techniques. A representative numerical example shows that the proposed IA-MS method provides narrower and more reliable bounds than the IA-CS.