首页> 外文会议>National Fusarium Head Blight Forum Conference >MAPPING OF QUANTITATIVE TRAIT LOCI FOR FHB AND DON RESISTANCE IN A DOUBLED HAPLOID POPULATION OF EVEREST X ART
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MAPPING OF QUANTITATIVE TRAIT LOCI FOR FHB AND DON RESISTANCE IN A DOUBLED HAPLOID POPULATION OF EVEREST X ART

机译:珠穆朗玛峰X艺术双倍单倍体群中FHB和DON抵抗量的定量特征基因座的映射

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The current project is aimed at mapping and identifying quantitative trait loci for resistance in wheat to spread of Fusarium head blight (FHB) symptoms (type II resistance) and spread and accumulation of deoxynivalenol toxin (DON) (type III resistance) throughout the spike. The mapping population consists of 148 doubled haploid lines from an Everest x Art cross. The disease study was performed using a point inoculation technique in a greenhouse with a 14 hour 30°C day and 10 hour 18.9° C night. Inocula of F. graminearum consisted of a conidial suspension using field isolate GZ 3639 native to Kansas. The conidial suspension was adjusted to 100 muL~(-1) for inoculations. Pots were arranged in a completely randomized design on four greenhouse benches. Twenty to forty heads were randomly selected from each line and inoculated after the heads emerged from the leaf sheath. Selected spikes were injected with 10 muL~(-1) of conidial suspension, via a micropipette; into a central spikelet (approximatelythe tenth fully developed spikelet from the base). Spikes were rated for percent infection after 14 days. Kernels were harvested separately from each spikelet in order to determine how DON moves throughout the spike. DON spread and accumulation were measured using a single kernel near-infrared spectroscopy (SKINR) instrument. FHB resistance was significantly correlated with DON resistance (r = 0.82, p = <0.001). Genotyping-by-sequencing (GBS) was used to discover and genotype SNP markers. TASSEL software was then used to call and filter markers resulting in 7,311 SNPs that were bi-allelic between the parents. A linkage map was created with MSTMap~R software using a LOD threshold of 8 and a no mapping distance threshold of 15 cM. The final linkage map consisted of 2,211 markers covering 31 linkage groups (LG) with an average of 71 markers per LG, average LG length of 93.6 cM, and average marker spacing of 1.3 cM. Standard interval mapping and composite interval mapping were performed separately for FHBand DON via the QTL package in RStudio v0.98.1080~R. Four QTL for type II resistance were found on LGs 1,2, 10, and 17. The QTL on LGs 1 and 2 were associated with alleles from Everest and explained 13.4% and 10.0% of the additive phenotypic variance, respectively. The QTL on LG 10 was associated with alleles from Art and explained 21.3% additive phenotypic variation. There were two LOD peaks on LG 17 at 52 cM using SIM (LOD = 3.12, p = 0.0501) and 79 cM using CIM (LOD = 3.36, p = 0.032). The more significant peak obtained from CIM was used as the location of the QTL and explained 11% of the additive phenotypic variation. The narrow-sense heritability estimate for type II resistance was slightly low at 0.13. There were no significant QTL observed fortype III resistance to spread of DON toxin. This experiment is being repeated and the results will be useful in determining if the sources of type II and type III resistance in the cultivars Art and Everest evolved independent of each other. This will allow for the potential to combine QTL for the release of germplasm with high resistance.
机译:目前的项目旨在映射和识别小麦的抗性的定量特性基因座,以扩散镰刀菌头枯萎病(FHB)症状(II型抗性),并在整个尖峰中扩散和积聚脱辛酚毒素毒素(III型抗性)。映射人口由珠穆朗玛峰X艺术十字架的148条双倍单倍体线组成。使用14小时30℃的温室中的点接种技术进行疾病研究,10小时和10小时18.9°C。 F. F. Ghaminearum的稻田属组成,使用原产于堪萨斯州的田间隔离GZ 3639的分枝悬浮液组成。将结合悬浮液调节至100多米〜(-1)以进行接种。在四个温室长椅上以完全随机的设计安排锅。从每一条线上随机选择二十到四十头,然后从叶子护套出来的头部后接种。通过微微液化电厂用10多米/(-1)的分枝悬浮液注入所选尖峰;进入中央小穗(大约第十次完全发育的小穗)。 14天后,尖峰被评为感染百分比。从每个小穗分开收获核,以确定在整个尖峰中的移动方式。使用单个内核近红外光谱(Skinr)仪器测量Don扩散和积累。 FHB抗性与Don电阻显着相关(r = 0.82,p = <0.001)。逐序列(GBS)用于发现和基因型SNP标记。然后使用TASSEL软件来调用和过滤标记,导致父母之间的Bi-Allic是7,311个SNP。使用8距离的LOD阈值和15cm的绘制距离阈值,使用MSTMAP〜R软件创建连接图。最终连杆地图由2,211个标记组成,覆盖31个连杆基团(Lg),平均每Lg的71个标记,平均Lg长度为93.6cm,平均标记间距为1.3cm。通过Rstudio V0.98.1080〜R中的QTL包分别为FHBand Don单独执行标准间隔映射和复合间隔映射。在LGS 1,2,10和17上发现了II型抗性的四个QTL。LGS 1和2上的QTL与珠穆朗玛峰的等位基因分别与添加剂表型方差分别解释了13.4%和10.0%。 LG 10上的QTL与来自艺术的等位基因有关,并解释了21.3%的添加剂表型变异。使用SIM(LOD = 3.12,P = 0.0501)和使用CIM(LOD = 3.36,P = 0.032),在52厘米上有两个LG 17峰值峰值。从CIM获得的峰越大用作QTL的位置,并解释了添加剂表型变异的11%。 II型抗性的窄感吸引力估计在0.13时略低。没有显着的QTL观察到Don Toxin的抗扩散的III III抗性。正在重复该实验,结果可用于确定II型和III型抗性在品种艺术中和珠穆朗玛峰彼此发展的抗源。这将允许QTL组合QTL以释放具有高抗性的种质。

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