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The Galvanic Corrosion between Anodized 6061 Aluminum Plate and C1100 Copper Plate Couple

机译:阳极氧化6061铝板和C1100铜板夫妇之间的电流腐蚀

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The galvanic corrosion behavior of anodic AA6061 Al and C1100 Cu couples is investigated. Anodized AA6061-T6 Al plates were produced at different thickness of 1μm, 5μm and 12μm, respectively. The galvanic corrosion current of anodized plate and C1100 copper plate couples was measured using a zero resistance ammeter for 8 hours in two solutions, 3.5wt.% NaCl solution and 1.0 wt.% NaClO solution under temperatures of 25°C, 40°C and 60°C. The results show that the AA6061-T6 aluminum plate without anodizing produced the highest galvanic corrosion current, 1200 μA/cm~2, among the tested specimens under flowing NaClO electrolyte at 60°C. Anodized AA6061-T6 aluminum plates with a 12μm anodized layer produced the lowest galvanic corrosion current, 15 μA/cm~2, in a static 3.5wt.% NaCl electrolyte at 25°C. Severe corrosion attack was observed at the aluminum specimen with thin and non-uniform anodized layer after the galvanic corrosion tests. The anodizing AA6061 Al plate process can effectively reduce the galvanic corrosion of the AA6061 Al and C1100 Cu couples.
机译:研究了阳极AA6061 A1和C1100 CU夫妇的电抗腐蚀行为。阳极氧化AA6061-T6 Al板以分别为1μm,5μm和12μm的不同厚度生产。使用零电阻吸管和C1100铜板耦合的电流腐蚀电流在两种溶液中,3.5wd。%NaCl溶液和1.0重量%的NaClO溶液在25℃,40°C和40℃的温度下溶液测量8小时。%NaClO溶液。 60°C。结果表明,AA6061-T6铝板没有阳极氧化,在60℃下在流动的NaClo电解质下的测试试样中产生最高的电抗腐蚀电流1200μA/ cm〜2。阳极氧化AA6061-T6铝板具有12μm阳极氧化层,在静态3.5wt中产生最低电流腐蚀电流,15μA/ cm〜2。%NaCl电解质在25℃下。在电抗腐蚀试验后,在具有薄且非均匀阳极氧化层的铝样品上观察到严重的腐蚀攻击。阳极氧化AA6061 Al板工艺可以有效地降低AA6061和C1100 Cu耦合的电抗腐蚀。

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