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Manganese oxide anodized from manganese films electrodeposited at different cathodic currents and its capacitive performance

机译:在不同的阴极电流下电沉积的锰膜阳极氧化锰氧化锰及其电容性能

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Nanostructured manganese oxide films were obtained by electro-oxidation of manganese films electrodeposited at two typical cathodic currents of 65 mA cm~(-2) (EDM-65 oxide) and 150 mA cm~(-2) (EDM-150 oxide) from sulfate solutions with additives. Obtained Mn oxide films were studied by scanning electron microscope, X-ray photoelectron spectroscopy, cyclic voltammetry and AC impedance. SEM study revealed that the Mn oxide films were mesoporous nanostructures on the EDM-150 oxide surface, while the EDM-65 oxide coating is homogeneous and compact. XPS results indicate that EDM-150 oxide had a higher content of anhydrous Mn oxide and structure water, which means that it had more anhydrous characteristics as compared to EDM-65 oxide. It was shown that porous nanostructured films showed good capacitive behavior for applications in electrochemical supercapacitors. The porous nanostructured films prepared at 150 mA cm~(-2) showed higher specific capacitance (SC) compared to the SC of the EDM-65 oxide films. The highest SC of 148 F g~(-1) in a voltage window of 0.8 V was obtained in 0.1 M Na_2SO_4 solutions at a scan rate of 25 mV s~(-1).
机译:通过以65mA cm〜(-2)(EDM-65氧化物)和150mA cm〜(-2)(EDM-150氧化物)的两个典型的阴极电流电涂覆的锰膜的电氧化通过电沉积的锰膜来获得纳米结构氧化锰膜。来自硫酸盐溶液与添加剂。通过扫描电子显微镜,X射线光电子体光谱,循环伏安法和AC阻抗研究了得到的Mn氧化物膜。 SEM研究表明,Mn氧化膜在EDM-150氧化物表面上是介孔的纳米结构,而EDM-65氧化物涂层是均匀且紧凑的。 XPS结果表明EDM-150氧化物具有更高的无水Mn氧化物和结构水含量,这意味着与EDM-65氧化物相比,它具有更高的无水特性。结果表明,多孔纳米结构薄膜显示出电化学超级电容器中的应用的良好电容性行为。与EDM-65氧化膜的SC相比,在150mA cm〜(-2)下制备的多孔纳米结构薄膜显示出较高的比电容(SC)。在0.8V的电压窗口中的最高SC为0.8V的0.1M Na_2SO_4溶液,扫描速率为25mV S〜(-1)。

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