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Efficient Ga(As)Sb quantum dot emission in AlGaAs by GaAs intermediate layer

机译:通过GaAs中间层高效Ga(AS)SB量子点发射

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Ga(As)Sb quantum dots (QDs) are epitaxially grown in AlGaAs/GaAs in the Stranski-Krastanov mode. In the recent past we achieved Ga(As)Sb QDs in GaAs with an extremely high dot density of 9.8-10~(10) cm~(-2) by optimization of growth temperature, Sb/Ga flux pressure ratio, and coverage. Additionally, the QD emission wavelength could be chosen precisely with these growth parameters in the range between 876 and 1035 nm. Here we report a photoluminescence (PL) intensity improvement for the case with AlGaAs barriers. Again growth parameters and layer composition are varied. The aluminium content is varied between 0 and 90%. Reflectance anisotropy spectroscopy (RAS) is used as in-situ growth control to determine growth rate, layer thickness, and AlGaAs composition. Ga(As)Sb QDs, directly grown in Al_xGa_(1-x)As emit no PL signal, even with a very low x ≈ 0.1. With additional around 10 nm thin GaAs intermediate layers between the Ga(As)Sb QDs and the AlGaAs barriers PL signals are detected. Samples with 4 QD layers and Al_xGa_(1-x)As/GaAs barriers in between are grown. The thickness and composition of the barriers are changed. Depending on these values PL intensity is more than 4 times as high as in the case with simple GaAs barriers. With these results efficient Ga(As)Sb QD lasers are realized, so far only with pure GaAs barriers. Our index-guided broad area lasers operate continuous-wave (cw) @ 90 K, emit optical powers of more than 2.50 mW and show a differential quantum efficiency of 54% with a threshold current density of 528 A/cm~2.
机译:Ga(AS)Sb量子点(QDS)在Stranski-Krastanov模式中在AlgaAs / GaAs中扩展。在最近的过去,通过优化生长温度,Sb / Ga磁通压力比和覆盖率,我们在GaA中实现了Ga(AS)的Ga(AS)Sb QDS,具有极高的点密度为9.8-10〜(10)cm〜(2)。另外,可以在876和1035nm之间的范围内精确地选择QD发射波长。在这里,我们向Algaas屏障报告了对壳体的光致发光(PL)强度改进。同样增长参数和层组合物改变。铝含量在0到90%之间变化。反射率各向异性光谱(RAS)用作原位生长控制以确定生长速率,层厚度和藻类组合物。 Ga(AS)SB QD,直接在AL_XGA_(1-x)中生长,因为即使在X≈0.1非常低的情况下也可以发出PL信号。通过在Ga(AS)SB QD和AlgaAs屏障PL信号之间的附加约10nm薄的GaAs中间层和AlgaAs屏障PL信号。生长带有4个QD层和AL_XGA_(1-x)的样品,介于/ GaAs屏障之间。屏障的厚度和组成改变。根据这些值,PL强度比简单的GaAs屏障在壳体中的高度高于4倍。使用这些结果,实现了效率的GA(AS)SB QD激光器,到目前为止仅适用于纯GAAs屏障。我们的指数引导的宽面积激光器操作连续波(CW)@ 90 k,发出超过2.50mW的光学功率,差分量子效率为54%,阈值电流密度为528A / cm〜2。

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