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Synthesis of Icosahedral Boron Arsenide Nanowires for Betavoltaic Applications

机译:甲基二罗朗砷酰亚胺纳米线的合成载体纳米线

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With a wide band gap of greater than 3.0 eV and the ability to self-heal from radiation damage, icosahedral boron arsenide (B_(12)As_2) is an apt candidate for use in next-generation betavoltaics. By capturing and converting high energy electrons from radioisotopes into usable electricity, "nuclear batteries" made from B_(12)As_2 could potentially power devices for decades. Compared to bulk crystals or epitaxial films, B_(12)As_2 nanowires may have lower defect densities or may even be defect-free, leading to better electrical properties and device performance. In our study, B_(12)As_2 nanowires were synthesized via vapor-liquid-solid (VLS) growth using platinum powder and nickel powder on silicon carbide and 20 nm thick nickel film on silicon substrates from 700 °C to 1200 °C. Platinum yielded the highest quality nanowires from 900 °C to 950 °C, resulting in platinum particles densely covered with wires formed by straight segments connected by sharp angular kinks. At these growth temperatures, diameters ranged from less than 30 nm to about 300 nm as determined by scanning electron microscopy and transmission electron microscopy. Growth temperatures of 850 °C or less produced curled wires 200-1000 nm in diameter. Transmission electron microscopy and selected area electron diffraction revealed excellent crystallinity in wires grown above 850 °C, while wires grown at or below 850 °C were partially amorphous. Wires grown from the 20 nm nickel film displayed similar morphologies at temperatures up to 850 °C; from 900 °C to 950 °C, straight, isolated wires were grown with diameters of 200-400 nm. Nickel powder only produced wires larger than 1 μm in diameter. The comparative quality and growth of B_(12)As_2 nanowires will be discussed.
机译:具有大于3.0 eV的宽带隙,射出辐射损伤的能力,ICOSAHEDRAL硼砷(B_(12)AS_2)是用于下一代BEAVOLTA的APT候选者。通过将从放射性同位素捕获和转换为可用电力的高能量电子,“由B_(12)AS_2制成的”核电电池“可能是几十年的电源设备。与散装晶体或外延膜相比,B_(12)AS_2纳米线可以具有较低的缺陷密度,或者甚至可以是无缺陷的,导致更好的电性能和装置性能。在我们的研究中,使用铂粉末和镍粉在碳化硅和20nm厚的镍膜上通过700℃至1200℃的硅基质上的蒸汽粉末和镍粉合成B_(12)AS_2纳米线。铂含有900℃至950℃的最高质量的纳米线,导致铂颗粒密集地覆盖着由通过尖锐角质扭结连接的直链段形成的线。在这些生长温度下,通过扫描电子显微镜和透射电子显微镜测定,直径范围小于30nm至约300nm。 850°C或更低的生长温度为直径200-1000nm的卷曲线。透射电子显微镜和所选区域电子衍射在850℃以上生长的电线中显示出优异的结晶度,而在850℃下生长的电线是部分无定形的。从20nm镍膜生长的电线在高达850°C的温度下显示出类似的形态;从900°C至950°C,直线,直径为200-400nm。镍粉仅产生直径大于1μm的线。将讨论B_(12)AS_2纳米线的比较质量和生长。

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