Production of Transparent heat windows of TiO2/Ag/TiO2, and investigation of their nanostructures

摘要

Using the resistive heated method, TiO2/Ag/TiO2 thin files (Transparent heat windows) in vertical deposition angle were deposited on SiO2 substrate, in high vacuum (HV) condition and 100°C. The thickness of TiO2 on glass substrate was 50°A, Silver film 125°A and 22S°A and the upper layer TiO2 with 115°A. All other deposition conditions were same for both samples. Atomic force microscope (AFM), and spectrophotometric methods were used to study the nanostructures of these samples in the range of FTIR. The purpose of this work is to find and produce the structure with the least energy waste.