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Photoluminescence and Raman Properties of Porous Silicon at Different Etching Times and Current Densities

机译:不同蚀刻时间和电流密度多孔硅的光致发光和拉曼特性

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摘要

We study the Photoluminescence (PL) and raman properties of porous silicon as function of etching time and current density. The result shows that PL spectra give a blue-shift trend and increasing intensity when etching time and current density increase. Samples that strongly emit at visible range then were analyzed using Raman measurement. As etching time increase, it shows that the Raman spectra of porous silicon slightly shift from bulk crystalline Silicon spectrum. A full half width maximum (FWHM) is gradually increasing with increasing current density.
机译:我们研究多孔硅的光致发光(PL)和拉曼特性,以及蚀刻时间和电流密度的功能。结果表明,当蚀刻时间和电流密度增加时,PL光谱产生蓝移趋势和增加的强度。然后使用拉曼测量分析在可见范围处强烈发射的样品。作为蚀刻时间增加,它表明多孔硅的拉曼光谱从散装晶体硅谱稍微转变。随着电流密度的增加,全半宽度最大(FWHM)逐渐增加。

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