Applications of Laser Plasma EUV Source Based on a Gas Puff Target

摘要

Laser plasma with temperature of the order of tens eV can be an efficient source of extreme ultraviolet (EUV). The radiation can be focused using different kind of optics giving sufficient fluence for some applications. In this work we present results of investigations concerning different applications of a laser plasma EUV source based on a double stream gas puff target. The experiments were connected with micromachining of organic polymers by direct photo-etching luminescence excited with EUV and using the source for EUV microscopy.