Research on Structural Properties of ZnO Thin Films Deposited on Different Substrates

摘要

In this article, ZnO thin films were deposited on different substrates, including glass, p-Si (100) and n-Si (111) by radio frequency (RF) magnetron sputtering technique. By changing substrate temperature and sputtering power, the influence of the sputtering rate was studied on structural properties of ZnO films. The film structural properties of the crystal phase, the surface morphology and the thickness were characterized by D/MAX-2200 XRD, JEOL JSM-6700F ESEM and AMBIOS XP-2 step meter respectively. The results showed that the films deposited on p-Si (100) substrates were preferred c-axis orientations, and their surfaces were smooth and compact when the substrate temperature was 300 Centigrade degrees.