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Hydrogenated nanostructure boron doped amorphous carbon films by DC bias

机译:氢化纳米结构硼掺杂DC偏压的无定形碳膜

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Hydrogenated nanostructure-boron doped amorphous carbon thin film carbon was deposited at different negative bias using custom-made deposition bias assisted-CVD. Solid of boron and palm oil were used as dopant and carbon source, respectively. The hydrogenated nanostructure amorphous films were characterized by Field emission scanning electron microscopy, Fourier transform infrared spectroscopy, Raman spectroscopy, while the photo-response studies of thin film is done by I-V measurement under light measurement. The results showed the carbon film were in nanostructure with hydrogen and boron might be incorporated in the film. The Raman spectra observed the increase of upward shift of D and G peaks as negative bias increased which related to the structural change as boron incorporated in carbon network. These structural changes were further correlated with photo-response study and the results obtained are discussed and compared.
机译:使用定制沉积偏压辅助-CVD在不同的负偏压下沉积氢化纳米结构 - 掺杂的无定形碳薄膜碳。硼和棕榈油的固体分别用作掺杂剂和碳源。氢化纳米结构非晶膜的特征在于现场发射扫描电子显微镜,傅里叶变换红外光谱,拉曼光谱,而在光测量下通过I-V测量进行薄膜的光响应研究。结果表明,碳膜用氢气和硼在膜中纳入膜中。拉曼光谱观察到D和G峰的向上偏移增加,因为与碳网络中的硼结构变化有关的负偏差增加。这些结构变化与光响应研究进一步相关,并讨论并比较了所获得的结果。

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