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Fabrication of Uniformly Growing Graphene Films via the Dip-coating Method

机译:通过浸涂法制造均匀生长的石墨烯膜

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The graphene (GE) films were fabricated in this paper through the deposition of graphene oxide (GO) sheets onto the quartz slide by means of dip-coating technique, followed by thermal annealing. The growth process and transmittance of the film were monitored by ultraviolet and visible spectrophotometer (UV-Vis), the surface morphology and structure were investigated by Atomic force microscopy (AFM), Scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS) and Raman. The sheet resistance of the film was also tested and results showed that the sheet resistance is about 60 KΩr~(-1) and the transmittance is as high as 81 % (at 550 nm).
机译:通过浸涂技术将石墨烯(GO)片材沉积在石英滑块上,在本文中制造石墨烯(GE)薄膜通过浸涂技术,然后进行热退火。 通过紫外线和可见分光光度计(UV-VI)监测薄膜的生长过程和透射率,通过原子力显微镜(AFM),扫描电子显微镜(SEM),X射线光电子能谱(XPS)研究了表面形态和结构。(XPS )和拉曼。 还测试了薄膜的薄层电阻,结果表明,薄层电阻约为60kΩ〜(-1),透射率高达81%(550nm)。

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