Influence of Magnetron Sputtering Parameters on Heat Volatilization Property of Tungsten-Rhenium Thin Film Thermocouples

摘要

The working time of tungsten-rhenium (W-Re) thin film thermocouples (TFTCs) is reduced for the reason of heat volatilization under non oxidizing environment. Influence of magnetron sputtering parameters on thermal volatilization property of tungsten-rhenium TFTCs were discussed by aging test and scanning electron microscope (SEM) test. We used different gas flow rate, sputtering power and the vacuum degree to make 9 samples of TFTCs film. The aging experiment showed that the suitable magnetron sputtering parameters can reduce the heat volatilization rate to 46.5nm/h.