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PURIFICATION OF BISMUTH(III) IODIDE FOR APPLICATION AS RADIATION SEMICONDUCTOR DETECTOR

机译:铋(III)碘化物用于辐射半导体检测器的应用

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This work describes the experimental procedure of a purification method of BiI_3 powder, aiming a future application of these semiconductor crystals as room temperature radiation detector. The Repeated Vertical Bridgman Technique applied to the purification, based on the melting and nucleation phenomena. An ampoule filled with a maximum of 25% by volume of BiI_3 powder mounted into the Bridgman furnace and vertically moved at a speed of 2 millimeters per hour, inside the furnace with programmed thermal gradient and temperature profile, at a maximum temperature of 530°C. The reduction of the impurities in the BiI, after each purification procedure, analyzed by the Instrumental Neutron Activation Analysis (IINAA), in order to evaluate the efficiency of the purification technique established in this work, to trace metal impurities. It demonstrated that the Repeated Bridgman is effective to reduce the concentration of many impurities in BiI_3, such as Ag, As, Br, Cr, K, Mo, Na and Sb. The crystalline structure of the BiI_3 crystal purified twice and three times was similar to the BiI_3 pattern. However, for BiI_3 powder and purified once, an intensity contribution of BiOI observed in the diffractograms.
机译:这项工作描述了BII_3粉末的纯化方法的实验程序,旨在将这些半导体晶体的未来应用作为室温辐射检测器。基于熔融和成核现象,应用于纯化的重复的垂直的Bridgman技术。安瓿最多填充到钻孔炉中的最多25%的BII_3粉末,并以每小时2毫米的速度垂直移动,在炉内,具有编程的热梯度和温度曲线,最高温度为530°C 。通过仪器中子激活分析(IINAA)分析在每种纯化过程之后的BII中的杂质的减少,以评估在这项工作中建立的纯化技术的效率,以追踪金属杂质。它证明,重复的Bridgman有效地降低了BII_3中许多杂质的浓度,例如Ag,如Ag,Br,Cr,K,Mo,Na和Sb。 BII_3晶体的晶体结构纯化两次,三次类似于BII_3图案。然而,对于BII_3粉末并纯化一次,在衍射图中观察到生物的强度贡献。

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