HIGH TEMPERATURE NANOINDENTATION UP TO 800°C FOR CHARACTERIZING HIGH TEMPERATURE PROPERTIES OF MATERIALS

摘要

One of the primary motivations for development of instrumented indentation was to measure the mechanical properties of thin films. Characterization of thin film mechanical properties as a function of temperature is of immense industrial and scientific interest. The major bottlenecks in variable temperature measurements have been thermal drift, signal stability (noise) and oxidation of/condensation on the surfaces. Thermal drift is a measurement artifact that arises due to thermal expansion/contraction of indenter tip and loading column. This gets superimposed on the mechanical behavior data precluding accurate extraction of mechanical properties of the sample at elevated temperatures. Vacuum is essential to prevent sample/tip oxidation at elevated temperatures.