Effect of Skin Impedance on Delay and Crosstalk in Lossy and Non-uniform On-Chip Interconnects

摘要

An efficient finite-difference time-domain (FDTD) model is presented to analyse time delay and the crosstalk noise in lossy non-uniform interconnects. The complementary metal oxide semiconductor (CMOS) is used as driver for non-uniform interconnects and terminated with capacitive loads. Further, the resistive losses at high frequency due to skin effect and shrinking of interconnects are inculcated in the proposed model and analysed the high frequency effects. The improved alpha power law model represents the nonlinear behaviour of CMOS drivers, and the non-uniform interconnect is modelled including skin effect by FDTD technique. Hence, the proposed algorithm accurately estimates the crosstalk noise and delay in non-uniform interconnects at high frequencies and the results of FDTD are validated using HSPICE simulations.