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SiGe heterojunction bipolar transistor technology for sub-mm-wave electronics — state-of-the-art and future prospects

机译:SiGe异质结双极晶体管技术,用于亚MM波电子产品 - 最先进的和未来前景

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An overview on the most recent and the expected future development of SiGe heterojunction bipolar transistor (HBT) performance for (sub-)mm-wave applications is provided. Achieving cut-off frequencies beyond 500 GHz (for ftand fmaxsimultaneously) has been made possible by recent European joint projects with a very low development cost compared to CMOS. Accurate device modeling proved to be a valuable guide for process development and a key enabler for minimizing circuit design and fabrication iterations as well as for creating a SiGe HBT technology roadmap. Fundamental differences between HBT and field-effect transistor (FET) high-frequency performance are discussed based on experimental and predicted data.
机译:提供了概述最新的和预期的SiGe异质结双极晶体管(HBT)性能的预期开发(Sub-)MM波应用。实现超过500 GHz的截止频率(f t 和F. max 同时)最近的欧洲联合项目已成为可能,与CMOS相比具有很低的开发成本。精确的设备建模证明是流程开发的有价值指南和用于最大限度地减少电路设计和制造迭代以及创建SiGe HBT技术路线图的关键推动器。基于实验和预测数据讨论了HBT和场效应晶体管(FET)高频性能之间的基本差异。

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