Tunable nano-pattern generation and photolithography using hybrid Kretschmann and Otto structures

摘要

We propose a continuous tuning SPPs interference photolithography using hybrid Kretschmann and Otto structures. The patterns are formed by the interference of two kinds of SPPs excited by Kretschmann structure and Otto structure respectively, and the tuning capability is implemented by changing the angle between the two kinds of SPPs beams and varying the amplitude and phase of corresponding incident beams. Numerical results show the flexibility and convenience in tuning of interference patterns and resolutions with high contrast, both one and two dimension periodic patterns can be generated and tuned easily. This proposed method is possible to develop a new tunable SPPs photolithography technique for fabrication of periodic nanostructures.