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Reduce the efficiency droop by p-doped quantum well barriers in InGaN multiple quantum well

机译:在IngaN多量子阱中通过P掺杂量子阱屏障降低效率下垂

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摘要

InGaN LEDs with different doped type and doping concentration of quantum well barriers are theoretically studied and compared by using the APSYS simulation program. Comparing with the undoped and the n-doped, the good efficiency profile is obtained when the quantum well barrier is p-doped. As the concentration of p-doped increases, the hole concentration in quantum well increases markedly. The optical performance; radiative recombination rate are improved and electron leakage is reduced.
机译:通过使用APSYS仿真程序,理论上和比较具有不同掺杂类型和掺杂浓度的掺杂类型和掺杂浓度的IngaN LED。与未掺杂和n掺杂的比较,当量子阱屏障被P掺杂时获得良好的效率曲线。随着P掺杂的浓度增加,量子中的空穴浓度良好地显着增加。光学性能;改善了辐射重组率,并且电子泄漏降低。

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