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Effect of Impurity Doping on Tunneling Conductance in AB-Stacked Bi-layer Graphene: A Tight-Binding Study

机译:杂质掺杂对AB堆叠双层石墨烯隧道电导的影响:紧密结合研究

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We report here a microscopic tight-binding model calculation for AB-stacked bilayer graphene in presence of biasing potential between the two layers and the impurity effects to study the evolution of the total density of states with special emphasis on opening of band gap near Dirac point. We have calculated the electron Green's functions for both the A and B sub-lattices by Zubarev technique. The imaginary part of the Green's function gives the partial and total density of states of electrons. The density of states are computed numerically for 1000 X 1000 grid points of the electron momentum. The evolution of the opening of band gap near van-Hove singularities as well as near Dirac point is investigated by varying the different interlayer hoppings and the biasing potentials. The inter layer hopping splits the density of states at van-Hove singularities and produces a V-shaped gap near Dirac point. Further the biasing potential introduces a U shaped gap near Dirac point with a density minimum at the applied potential(i.e. at V/2).
机译:在这里,我们在这里报告了两层之间存在偏置电位的AB堆叠双层石墨烯的微观紧密模型计算,以研究各州的总密度的演变,特别强调在DIRAC点附近的带隙的开口。我们已经计算了通过Zubarev技术的A和B子格子的电子绿色功能。绿色函数的虚部,提供了电子状态的部分和总密度。状态的密度在数字上计算了电子动量的1000×1000个网格点。通过改变不同的层间跳水和偏置电位,研究了van-hove奇点附近的带隙的开口和近Dirac点的演变。跨层跳跃在凡骑士奇迹处的状态分裂,并在Dirac点附近产生V形间隙。此外,偏置电位在施加电位下以密度最小的DIRAC点引入U形间隙(即在V / 2)附近。

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