首页> 外文会议>PRiME Joint International Meeting of the Electrochemical Society, the Electrochemical Society of Japan, and the Korean Electrochemical Society >High-Performance Photodetectors using Transition Metal Dichalcogenide (TMD)- based Hybrid Structures
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High-Performance Photodetectors using Transition Metal Dichalcogenide (TMD)- based Hybrid Structures

机译:高性能光电探测器使用过渡金属二甲基化物(TMD)的混合结构

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We demonstrate the high-performance TMD (WSe_2 and ReSe_2) photodetectors with a high responsivity (1.3×10~6 A/W for WSe_2 and 1.2×10~6 A/W for ReSe_2) and fast temporal photoresponse (rising/decaying time: 2.8/20.8 ms for WSe_2 and 58/263 ms for ReSe_2). These were achieved by (i) applying PPh_3 n-doping technique and (ii) inserting passivating layers (h-BN or APTES layers). Through the PPh_3-based n-doping process, we significantly increased the photoresponsivity of the both WSe_2 and ReSe_2 photodetectors (2.7×10~3 → 4.3×10~5 A/W for WSe_2 and 4.0×10~3 → 3.7×10~4 A/W for ReSe_2). In particular, by inserting a h-BN layer at the WSe_2/SiO_2 interface and an APTES layer at the ReSe_2/SiO_2 interface, respectively, we further enhanced fast temporal photoresponse (rising/decaying time: 97/827 → 2.8/20.8 ms for WSe_2) and high responsivity (3.7×10~4 → 1.2×10~6 A/W for ReSe_2).
机译:我们展示了具有高响应度的高性能TMD(WSE_2和Rese_2)光电探测器(对于WSE_2和1.2×10〜6 A / W for Rese_2的1.3×10〜6 A / W)和快速的时间光响应(上升/衰减时间: 2.8 / 20.8 ms for WSE_2和RESE_2的58/263 ms)。通过(i)施加PPH_3 n掺杂技术和(ii)插入钝化层(H-BN或APTES层)来实现这些。通过基于PPH_3的N掺杂过程,我们显着增加了WSE_2和RESE_2光电探测器的光响应性(2.7×10〜3→4.3×10〜5A / W对于WSE_2和4.0×10〜3→3.7×10〜 4 A / W for Rese_2)。特别地,通过分别在WSE_2 / SIO_2接口处插入H-BN层和RESE_2 / SIO_2接口的APTES层,我们进一步增强了快速的时间光响应(上升/衰减时间:97/827→2.8 / 20.8 ms WSE_2)和高响应度(3.7×10〜4→Rese_2的1.2×10〜6 A / W)。

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