Growth of Anatase TiO_2 Thin Film for Photokilling of Bacteria by DC Reactive Magnetron Sputtering Technique

摘要

Titanium dioxide (TiO_2) thin films have been deposited on Si-wafer and glass slide by DC reactive magnetron sputtering technique at different O_2 gas flow rates. The crystal structure was characterized by grazing-incidence X-ray diffraction (GIXRD), surface morphology was analyzed by atomic force microscopy (AFM) and disinfection of surfaces by photo catalytic oxidation with TiO_2 and UV light irradiation. The results showed that, from GIXRD results, all as-deposited TiO_2 films have crystal structure of TiO_2 corresponding to the A(101) and A(200). AFM results showed that the film thicknesses increase from 183 nm to 238 nm with increasing of O_2 gas flow rate, while the film roughness was in range of 4.8 nm to 5.9 nm. The as-deposited anatase TiO_2 thin film in this work can kill the bacteria when expose to the UV light.