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Characterization of Micro-arc Oxidation of ZL109 Cast Al-Si Alloy

机译:ZL109铸造Al-Si合金微弧氧化的特征

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The growth process of micro-arc oxidation films on ZL109 cast Al-Si alloy was investigated and the relation between current density and arc voltage, arc time and the growth rate of the films was discussed. Additionally, the morphology, element distribution and phase components of the films of the ZL109 higher-silicon cast aluminium alloys were analyzed. Results indicated that in the oxidation process, arc voltage was a constant under the condition of varied current densities; moreover, when current density increased, arc time shortened, film thickness increased, and the growth rate of films first increased and then decreased. The oxidation film was mainly composed of mullite (3Al_2O_3 · 2SiO_2), α-Al_2O_3 and γ-Al_2O_3 phase, among which, the content of mullite was the highest.
机译:研究了ZL109铸造Al-Si合金上微弧氧化膜的生长过程,并讨论了电流密度和电弧电压之间的关系,电弧时间和膜的生长速率。另外,分析了ZL109高硅浇铸铝合金膜的形态,元件分布和相组分。结果表明,在氧化过程中,电弧电压在各电流密度的条件下是恒定的;此外,当电流密度增加时,缩短电弧时间,膜厚度增加,并且薄膜的生长速率首先增加,然后减少。氧化膜主要由莫来石(3Al_2O_3·2 SiO_2),α-Al_2O_3和γ-Al_2O_3相组成,其中莫来石的含量最高。

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