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Investigation the Flow Charge Rate at InAs/D149 and ZnO/D149 System Using Theoretical Quantum Model

机译:使用理论量子模型调查INAS / D149和ZnO / D149系统的流量电荷速率

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In this ongoing study, we investigated a theoretical study of flow charge transfer at semiconductor-liquid interfaces. The quantum method has employed in obtaining the flow rate of InAs and ZnO semiconductors with D149 interface. The both system have maximum flow charge rate with DichIoroethane solvent, the ZnO/D149 has large flow charge rate compare to InAs/D149 system for the same overlapping coupling. Flow charge rate was decreasing with increasing the potential barrier and vice versa for both system and the flow rate increasing eith decreasing the orientation transition energy
机译:在这个正在进行的研究中,我们调查了半导体液体界面流量电荷转移的理论研究。量子方法采用了具有D149界面的InAs和ZnO半导体的流速。两种系统具有最大流量电荷速率,具有二硫代乙烷溶剂,ZnO / D149具有与INAS / D149系统相比的大流量电荷速率,用于相同的重叠耦合。随着系统的潜在屏障和反之亦然,流量充电率降低了潜在的屏障,并且流量增加了ETH的流速降低了取向过渡能量

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