Fabrication and characterization of nanometric SiOx/SiOy multilayer structures obtained by LPCVD

摘要

This work presents the fabrication of nanometric multilayer structures and their characterization by Atomic Force Microscopy, Photoluminescence and Fourier Transform Infra Red spectroscopy. The structures were deposited by Low Pressure Chemical Vapor Deposition (LPCVD). Three types of multilayer structure were fabricated. After the deposition some samples were annealed in N_2 ambient for three hours. It was found that the structures keep the characteristics of each layer.