首页> 外文会议>LDSD 2011 >Properties of the In_2O_3-Si interface: An ab initio study of a model geometry
【24h】

Properties of the In_2O_3-Si interface: An ab initio study of a model geometry

机译:IN_2O_3-SI接口的属性:模型几何的AB Initio研究

获取原文

摘要

The In_2O_3(001)-Si(001) heterojunction is studied by means of the ab initio density functional theory, quasiparticle corrections, and the supercell method. We construct a model interface based on the idea of a coincidence lattice, only Si-O interface bonds and biaxially strained In_2O_3. The properties of the interface and their consequences for the junction are mainly described in terms of electronic band levels and charge redistribution. The results indicate a type II heterostructure caused by interface dipole alteration due to electron rearrangements.
机译:通过AB初始密度泛函,Quasiparticle校正和超级电池方法研究IN_2O_3(001)-SI(001)异质结。我们基于巧合格的思想构建了模型界面,只有Si-O接口键和双轴紧张In_2O_3。接口的性质及其对结的后果主要在电子频带水平和电荷再分布方面描述。结果表明,由于电子排列引起的界面偶极改变引起的II型异质结构。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号